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- Article name
- DEVELOPMENT OF EPITAXIAL EQUIPMENT WITH SINGLE-WAFER REACTOR
- Authors
- Pogalov A. I., , dtm@miee.ru, Moscow Institute of Electronic Technology (Technical University), Moscow, Russia
Kravchenko A. A., , dtm@miee.ru. el_kon@inbox.ru, National Research University of Electronic Technology, Moscow, Russia
- Keywords
- epitaxy / development / epitaxial equipment / single-wafer reactor / technical characteristics / computer modeling
- Year
- 2015 Issue 2 Pages 55 - 58
- Code EDN
- Code DOI
- Abstract
- Provides an overview of the epitaxial equipment market and prospects of development of Russian equipment, the results of modeling technical characteristics of epitaxy process.
- Text
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